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Vacuum Thermal Evaporator (Angstrom Engineering Inc)

by darcy last modified 06-20-2006 16:35

Base pressure: 5 x 10^-8 Torr
Typical deposition pressure: 10^-7 Torr
Compatible Materials: Small molecule organics (e.g. Alq3, CuPc, C60) and non-refractory metals (e.g. Al, Au, Ag, Mg)
Substrate size: 4 inches diameter


2001 Dow

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Vacuum Thermal Evaporator (Angstrom Engineering Inc)
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Max Shtein

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