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Alumina Tube FurnaceLocation:
Dow 2117
Lindberg controller for heating up to 1000 deg C. Used for target sintering and thin film post-deposition anneals |
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Electrical Measurement FacilitiesLocation:
DOW 2117
Designed for 2-point or 4-point Van der Pauw electrical measurements of both low and high-resistivity thin films. 2.5 kG magnet for Hall measurements. Impedance Analyzer for electrochemical characterization. |
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Gas Sensor Test ApparatusLocation:
Dow 2117
Quartz chamber with gas inlet/outlet. Resistive heating up to 700 deg C. Four MKS Mass Flow Controllers (MFC) allow in-situ testing under different gas atmospheres and pressures. |
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Gatan Dimple GrinderLocation:
Dow 2117
Used to dimple and polish the surface of TEM specimens before ion-milling |
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Gatan Precision Ion Polishing System (PIPS)Location:
Dow 2117
Precision Ion-milling of TEM plan or cross-section view specimens using (2 Ar guns) |
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Liquid Nitrogen CryostatLocation:
Dow 2117
Oxford Applied Research DNV Optistat for LN2 temperature optoelectronic measurements |
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Neocera PLD SystemLocation:
B-112 Gerstacker
15" PLD chamber evacuated by a V-250 pump. First-stage pumping from atmosphere to 25mTorr by sorption pump. Target carousel and substrate heater by Neocera. Gauging by nude ion gauge and thermocouple gauge. |
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Thermionics PLD/MBE SystemLocation:
B-112 Gerstacker
UHV-PLD system with a wire-sealed bottom flange designed for MBE. It is equipped with a load-lock chamber and magnetic transfer arm for in-vacuum transfer of targets and substrates. Adjustable target-substrate distance, radiative heating up to 1000 C. Complex substrate manipulator for precise positioning. |
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UV Excimer LaserLocation:
B-112 Gerstacker
248 nm KrF Excimer laser, 10-50 Hz, up to 600mJ energy output, 25 ns pulsewidth. |
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